Mask picks

WHS produces next-generation lithography photomask handling tools designed to minimize particle contamination, prevent electrostatic discharge (ESD), and improve ergonomics for technicians. Whether you're working with reticles or masks, WHS offers a solution to meet your photomask handling requirements. If you need a custom-engineered product, WHS can create a tailored solution to fit your exact needs.

The WHS-L photomask handling series comprises three models, each designed for specific applications. The WHS-L1 has an encapsulated gearbox with synchronized grippers for precision handling of photomasks and reticles from the side tangential edge—ideal for scenarios where accuracy and minimal contact are essential. The WHS-L2 is designed for horizontal offset applications, providing flexibility when the WHS-L1 isn't suitable. The WHS-L3 is crafted for handling advanced Extreme Ultraviolet (EUV) masks, featuring four low-profile grippers that seamlessly interface with EUV reticle pods, ensuring stability and security.