Introducing the WHS-L Series
When it comes to precision and care in photomask handling, WHS leads the way with the WHS-L series. Designed to meet the exacting demands of the semiconductor industry, the WHS-L1, WHS-L2 and WHS-L3 models are the ultimate tools for handling valuable photomasks and reticles. They minimize contamination risk and prevent electrostatic discharge (ESD) damage to critical chrome layers, ensuring that your photomasks remain pristine.
The WHS-L1 series is the go-to choice for most photomask handling situations, providing a side-profile grip that ensures maximum safety. This standard tool never positions you directly over the mask, reducing the risk of contamination. Its opening and closing mechanism is encapsulated and geared for precise operation and cleanliness, adhering to the highest industry standards.
The WHS-L2 series is designed for specialized applications where a horizontal offset is needed. This tool is ideal when accessing mask from the side profile is not feasible, offering flexibility for unique handling requirements. Its design allows for mask placement in special carriers, metrology tool stages, and mask cleaning equipment, making it an excellent choice for applications where standard tools don't fit in.
The WHS-L3 series is specifically engineered for Extreme Ultraviolet (EUV) masks. With four low-profile grippers that interface seamlessly, with EUV reticle pods, the WHS-L3 provides secure and stable manipulation of these advanced masks. It's constructed with high-quality materials, offering durability, ESD safety, and a compact design suited for efficient cleanroom operations.
