WHS

Horizontal Offset Mask Handling Mechanical Pick (WHS-L2) 9x9x0.120 Photomasks and Reticles

Horizontal Offset Mask Handling Mechanical Pick (WHS-L2) 9x9x0.120 Photomasks and Reticles

Product description

Applications:

  • Transfer - Transferring photomasks and reticles manually between storage boxes in the stockroom mask library and production mask boxes like Reticle SMIF Pods (RSP), Nikon cartridge reticle boxes, or Canon cartridge reticle boxes.
  • Inspection - Performing macro integrity checks during transfer, where mask handling operators visually inspect masks for bar code ID, particles, chrome defects, contamination, or damage to the pellicle frame or film.
  • Mask aligners - Loading and unloading photolithography mask aligner tools using mask picks.
  • Metrology - Loading and unloading microscopes and metrology tools for inspecting masks and reticles using mask picks.
  • Cleaning - Handling photomasks during regular cleaning applications such as spot cleaning and full submersion solvent cleans.
  • Mask shops - Commonly used in the manufacturing production areas and repair of masks in mask shops.
     

The WHS-L2 series is a precision-engineered, normally-closed (consistent-force) mechanical pick designed for horizontal offset grip handling of 5" to 9" photomasks. By gripping from the tangential edge, the WHS-L2 reduces contamination risks by eliminating contact with sensitive chrome surfaces, making it ideal for critical semiconductor processes.

Constructed from advanced materials, the WHS-L2 ensures long-lasting durability with antistatic properties and excellent chemical resistance. It is designed for use in ISO 3 (FS209E Class 1) cleanrooms, meeting the highest standards of cleanliness and contamination control.

The WHS-L2 is highly versatile and suited for a wide range of applications, including manual transfers of photomasks and reticles between storage boxes and production environments such as Reticle SMIF Pods, Nikon, and Canon reticle boxes. It is also ideal for macro integrity inspections during transfers, allowing operators to check for barcode IDs, particles, chrome defects, and damage to the pellicle frame or film. The tool is further optimized for use in mask aligners and metrology equipment.

The WHS-L2 ships with a specially designed tabletop pedestal holder that keeps the mask pick clean and protected from damage between uses, enhancing its longevity and maintaining performance.

Manufactured in an ISO9001 certified facility and CE certified, the WHS-L2 meets international quality and safety standards, offering a robust and reliable solution for photomask handling in semiconductor fabrication and mask shops.

WHS

Horizontal Offset Mask Handling Mechanical Pick (WHS-L2) 9x9x0.120 Photomasks and Reticles

Choose your size:
Normally-closed tangential-edge handling
Antistatic construction with ground path
Ergonomic left/right hand use
Adjustable grip force
Applications: transfers, inspection, mask aligners, cleaning
Including tabletop holder

Specifications

Brand
WHS
Product Number
WHS-L2-9120
Material
Antistatic Polyoxymethylene 
Mask Size
9x9x0.120
Grip hold
Horizontal grip
Holder
With holder
Handling
Normally closed
Material gripper insert
Viton elastomer
Cleanroom designation
ISO 3 (Class 1 FS209E)
Status
Request information

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